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  <titleInfo>
    <title>Catalytic properties of Al2O3 deposited by ion sputtering using DC and RF sources</title>
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    <namePart>RESZKA, Kazimierz.</namePart>
    <namePart type="termsOfAddress">Politechnika Koszalińska - Wydział Mechaniczny, Katedra Inżynierii Materiałowej</namePart>
    <namePart type="date">1996 -</namePart>
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    <namePart>CZYŻNIEWSKI, Andrzej.</namePart>
    <namePart type="termsOfAddress">Politechnika Koszalińska - Wydział Mechaniczny, Katedra Inżynierii Materiałowej</namePart>
    <namePart type="date">1996 -</namePart>
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    <namePart>GILEWICZ, Adam.</namePart>
    <namePart type="termsOfAddress">Politechnika Koszalińska - Instytut Mechatroniki, Nanotechnologii i Techniki Próżniowej, Zakład Nanotechnologii Próżniowo-Plazmowej</namePart>
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  <note type="statement of responsibility">K. Reszka, J. Rakoczy, Z. Żurek, A. Czyżniewski, A. Gilewicz, M. Homa.</note>
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    <titleInfo>
      <title>Vacuum. -</title>
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    <identifier type="issn">0042-207X</identifier>
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      <text>2005, Vol. 78, s. 149-155</text>
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